In the semiconductor industry, a combination of high purity and excellent high temperature properties make fused quartz tubing an ideal furnace chamber for processing silicon wafers. The material can tolerate the wide temperature gradients and high heat rates of the process. Its high purity creates the low contamination environment required for achieving superior wafer yields.
The stringent requirements of today’s advanced semiconductor processes demand continued advancement in materials used in the process chamber. These developments have impacted heavily on quartz producers, requiring both larger tube diameter developments and significantly higher levels of purity. Momentive Performance Materials has responded on both counts.
Quartz tubing is available in a full range of sizes, including diameters up to 550mm. Diameter and wall thickness dimensions are tightly controlled. Special heavy wall thicknesses are available on request. By finding new and better sources of raw material, expanding and modernizing production facilities, and upgrading quality control functions, Momentive Performance Materials has reduced contaminant levels in its fused quartz tubing to less than 25 ppm, with alkali levels below 1 ppm.
GE 214 LD is the large diameter grade industry standard tubing. For all but highly specialized operations, this low cost tubing offers the levels of purity, sag resistance, furnace life and other properties that diffusion and CVD processes require.
For superior performance at elevated temperatures, GE 214 LDH furnace tubing gives process engineers a better balance between the effects of higher temperatures and heavier wafer loads.
Clear fused quartz with the same excellent properties as GE 214 but for large diameter applications.
Used by the semiconductor, PV industry for diffusion, oxidation and LPCVD processing.